Mask defect printability at 0.18-ヲフm design rules for 193-nm lithography
- Author(s):
- Yan,P. ( Intel Corp. )
- Tran,A.
- Schmidt,M.R.
- Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 308
- Page(to):
- 318
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
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