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Planarizing BARC 0.32-ｦﾌm i-line lithography process for the reduction of intradie CD variation

Author(s):
Johnson,J.R. ( SGS-Thomson Microelectronics )
Davis,A.M.
Bair,A.E.
Nunan,P.D.
III,C.R.Spinner
Spak,M.A.
Dammel,R.R.
2 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. Year:
1997
Page(from):
191
Page(to):
203
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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