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Minimization of DUV multi-interference effect in 0.25-ヲフm device fabrication

Author(s):
Kim,J.H. ( Hyundai Electronics Industries Co.,Ltd. )
Moon,S.C.
Ko,B.S.
Park,J.H.
Lee,T.G.
Shin,K.S.
Kim,D.H.
2 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. date:
1997
Page(from):
182
Page(to):
190
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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