Blank Cover Image

Full-field CD control for sub-0.20-ｦﾌm patterning

Author(s):
Sturtevant,J.L. ( Motorola )
Allgair,J.
Barrick,M.W.
Fu,C.
Green,K.G.
Hershey,R.R.
Litt,L.C.
Maltabes,J.G.
Nelson,C.
Roman,B.J.
Singelyn,J.
6 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. Year:
1997
Page(from):
137
Page(to):
145
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning

Sturtevant,J.L., Allgair,J., Fu,C.-C., Green,K.G., Hershey,R.R., Kling,M.E., Litt,L.C., Lucas,K.D., Roman,B.J., …

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Advanced mask cleaning for 0.20-ｦﾌm technology:an integrated user-supplier approach

Poschenrieder,R., Hay,B., Beier,M., Hourd,A.C., Stumer,H., Gairing,T.M.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Implementation of a closed-loop CD and overlay controller for sub-0.25-ｦﾌm patterning

Sturtevant,J.L., Weilemann,M.R., Green,K.G., Dwyer,J., Robertson,E., Hershey,R.R.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Manufacturing considerations for implementation of scatterometry for process monitoring

Allgair,J., Benoit,D.C., Hershey,R.R., Litt,L.C., Abdulhalim,I.S., Braymer,B., Faeyrman,M., Robinson,J.C., Whitney,U.K., …

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

Allgair,J.A., Benoit,D.C., Drew,M., Hershey,R.R., Litt,L.C., Herrera,P.P., Whitney,U.K., Guevremont,M., Levy,A., …

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J., Archie,C.N., Banke,W., Bogardus,H., Griffith,J.E., Marchman,H.M., Postek,M.T., Saraf,L.H., Schlesinger,J.E., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Practical implementation of top-surface imaging process by silylation to sub-0.20-ｦﾌm lithography

Park,B.J., Baik,K.H., Kim,H.K., Kim,J.W., Bok,C.K., Vertommen,J., Rosenlund,R.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings High-power,high-efficiency,and highly uniform 1.3-ｦﾌm uncooled InGaAsP/InP strained multiquantum-well lasers

Kojima,K., Focht,M.W., Freund,J.M., Geary,J.M., Glogovsky,K.G., Guth,G.D., Karlicek,R.F., Luther,L.C., Przybylek,G.J., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Planarizing BARC 0.32-ｦﾌm i-line lithography process for the reduction of intradie CD variation

Johnson,J.R., Davis,A.M., Bair,A.E., Nunan,P.D., III,C.R.Spinner, Spak,M.A., Dammel,R.R.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Process issues of sub-0.20-ｦﾌm contact hole patterns for logic devices and DRAM

Yang,H., Yoon,J., Jeong,G., Huh,H., Kim,J.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

Patterson, K., Litt, L.C., Maltabes, J.G., Hughes, G.P., Robertson, T., Montgomery, B.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12