Optical proximity effect of a next-generation superresolution technique

Optical proximity effect of a next-generation superresolution technique

Author(s):: Kamon,K. ( Yokohama Research Ctr.and Mitsubishi Electric Corp. )
Publication title:: Optical Microlithography X
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3051
Pub. Year:: 1997
Page(from):: 66
Page(to):: 76
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819424655 [081942465X]
Language:: English
Call no.:: P63600/3051
Type:: Conference Proceedings

Details

TDL ID:	ZA00016573
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1997 : 10th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.12-1997.03.14

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