Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry

Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry

Author(s):

Publication title:

Materials science applications of ion beam techniques : proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques, incoeporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 9-12 1996

Title of ser.:

Materials science forum

Ser. no.:

248-249

Pub. Year:

1997

Page(from):

229

Page(to):

232

Pub. info.:

Zuerich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878497676 [0878497676]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00016500
Series ID:	PA00000012
Conf. info. (Name):	International Symposium on Materials Science Applications of Ion Beam Techniques ; German-Australian Workshop on Ion Beam Analysis
Conf. info. (Number):	1996 ; 1st
Conf. info. (Venue):	Seeheim, Germany
Conf. info. (Date):	1996.09.09-1996.09.12

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