In situ monitoring by mass spectrometry of laser ablation plumes used in thin film deposition

In situ monitoring by mass spectrometry of laser ablation plumes used in thin film deposition

Author(s):

Hastie, John W. ( National Institute of Standards and Technology )
Paul, Albert J.
Bonnell, David W.
Schenck, Peter K.

Publication title:

Synthesis and characterization of advanced materials

Title of ser.:

ACS symposium series

Ser. no.:

681

Pub. Year:

1998

Page(from):

39

Page(to):

50

Pub. info.:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841235403 [0841235406]

Language:

English

Call no.:

A05800/681

Type:

Conference Proceedings

Details

TDL ID:	ZA00016486
Series ID:	PA00000004
Conf. info. (Name):	National Meeting of the American Chemical Society
Conf. info. (Number):	212th
Conf. info. (Venue):	Orlando, FL, USA
Conf. info. (Date):	1996.08.25-1996.08.29

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