Image sensing method and defect detection algorithm for a 256-Mb and 1-Gb DRAM mask inspection system
- Author(s):
- Inoue,H. ( Toshiba Corp.(Japan) )
- Okuda,K. ( Toshiba Corp.(Japan) )
- Nomura,T. ( Toshiba Corp.(Japan) )
- Tsuchiya,H. ( Toshiba Corp.(Japan) )
- Tabata,M. ( Toshiba Corp.(Japan) )
- Publication title:
- Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3096
- Pub. Year:
- 1997
- Page(from):
- 462
- Page(to):
- 469
- Pub. info.:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425164 [0819425168]
- Language:
- English
- Call no.:
- P63600/3096
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Robust defect detection method using reference image averaging for high-throughput SEM wafer pattern inspection system [6152-181]
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection …
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
11
Conference Proceedings
Position-sensing grating interferometer for a specular object: analysis considering the aberration
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Development of a next-generation e-beam lithography system for 1-Gb DRAM masks
SPIE-The International Society for Optical Engineering |