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New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs

Author(s):
Tabata,M. ( Toshiba Corp.(Japan) )
Yamashita,K. ( Toshiba Corp.(Japan) )
Tsuchiya,H. ( Toshiba Corp.(Japan) )
Nomura,T. ( Toshiba Corp.(Japan) )
Inoue,H. ( Toshiba Corp.(Japan) )
Watanabe,T. ( Toshiba Corp.(Japan) )
Tojo,T. ( Toshiba Machine Corp.(Japan) )
Yoshino,H. ( Topcon Corp.(Japan) )
3 more
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
415
Page(to):
422
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

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