0.35-ヲフm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology
- Author(s):
- Raphaelian,M.L. ( Micrion Corp.(USA) )
- Ellis,M. ( Micrion Corp.(USA) )
- Ferranti,D.C. ( Micrion Corp.(USA) )
- Stewart,D.K. ( Micrion Corp.(USA) )
- Publication title:
- Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3096
- Pub. Year:
- 1997
- Page(from):
- 383
- Page(to):
- 397
- Pub. info.:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425164 [0819425168]
- Language:
- English
- Call no.:
- P63600/3096
- Type:
- Conference Proceedings
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