Photomask fabrication feasibility for next-generation reticle format

Author(s):

• Katsumata,M. ( Sony Corp.(Japan) )
• Kawahira,H. ( Sony Corp.(Japan) )
• Nozawa,S. ( Sony Corp.(Japan) )

Publication title:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3096

Pub. Year:

1997

Page(from):

198

Page(to):

205

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

Language:

English

Call no.:

P63600/3096

Type:

Conference Proceedings