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Automated OPC for application in advanced lithography(Invited Paper)

Author(s):
Ronse,K. ( Interuniv.Microelectronics Ctr.(Belgium) )
Tritchkov,A. ( Interuniv.Microelectronics Ctr.(Belgium) )
Randall,J. ( Interuniv.Microelectronics Ctr.(Belgium) )
Jonckheere,R. ( Interuniv.Microelectronics Ctr.(Belgium) )
Ghandehari,K. ( Interuniv.Microelectronics Ctr.(Belgium) )
Van den hove,L. ( Interuniv.Microelectronics Ctr.(Belgium) )
1 more
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
138
Page(to):
144
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

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