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Performance improvement in e-beam reticle writer HL-8OOM

Author(s):
Satoh,H. ( Hitachi,Ltd.(Japan) )
Someda,Y. ( Hitachi,Ltd.(Japan) )
Saitou,N. ( Hitachi,Ltd.(Japan) )
Kawasaki,K. ( Hitachi,Ltd.(Japan) )
Mizuno,K. ( Hitachi,Ltd.(Japan) )
Kadowaki,Y. ( Hitachi,Ltd.(Japan) )
Hoga,M. ( Hitachi,Ltd.(Japan) )
Soga,T. ( Hitachi,Ltd.(Japan) )
3 more
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
72
Page(to):
83
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

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