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CD variation sources of photomask

Author(s):
  • Kim,B.G. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Choi,S.W. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Yu,Y.H. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Yoon,H.S. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Sohn,J.M. ( Samsung Electronics Co.,Ltd.(Korea) )
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
42
Page(to):
52
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

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