Blank Cover Image

CD variation sources of photomask

Author(s):
  • Kim,B.G. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Choi,S.W. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Yu,Y.H. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Yoon,H.S. ( Samsung Electronics Co.,Ltd.(Korea) )
  • Sohn,J.M. ( Samsung Electronics Co.,Ltd.(Korea) )
Publication title:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3096
Pub. Year:
1997
Page(from):
42
Page(to):
52
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
Language:
English
Call no.:
P63600/3096
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask technology for 0.18-ｦﾌm device generation

Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Improved process control of photomask fabrication in e-beam lithography

Cha,B.-C., Park,J.-H., Choi,Y.-H., Kim,J.-M., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks

Jeong,W.G., Lee,S.W., Kim,D.H., Yoon,Y.J., Lee,D.H., Choi,B.Y., Choi,S.-S., Jung,S.M., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Parameters affecting megasonic power transmittance in the megasonic cleaning process

Kim,Y.H., Park,J.H., Lee,K.H., Choi,S.W., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Park, J.R., Kim, S.H., Yeo, G.-S., Choi, S.-W., Ki, W.-T., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Analysis of photomask CD errors depending on development methods

Moon,S.-Y., Ki,W.-T., Cha,B.-C., Choi,S.-W., Yoon,H.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Cho, S.-Y., Ahn, W.-S., Cho, W.-I., Sung, M.-G., Moon, S.-Y., Choi, S.-W., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Impact of mask CD error on wafer CD error at low-k1 photolithography

Kim, B. -G., Choi, S. -W., Choi, J. -H., Chun, C. -U., Yoon, H. -S., Sohn, J. -M.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Current status of mask CD uniformity as related to e-beam system

Lim,S.-C., Kim,B.-G., Choi,S.-W., Lee,K.-H., Cho,H.-J., Yu,Y.-H., Cho,H.-K., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Cho, S.-Y., Ahn, W.-S., Cho, W.-I., Sung, M.-G., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Resolution enhancement with thin Cr for chrome mask making

Cha,B.C., Choi,S.W., Kim,J.M., Cho,H.J., Sohn,J.M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12