Thin resist performance comparison for advanced e-beam reticle fabrication

Author(s):

• Kobayashi,H. ( HOYA Corp.(Japan) )
• Higuchi,T. ( HOYA Corp.(Japan) )
• Asakawa,K. ( HOYA Corp.(Japan) )
• Yokoya,Y. ( HOYA Corp.(Japan) )
• Yamashiro,K. ( HOYA Corp.(Japan) )

Publication title:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3096

Pub. Year:

1997

Page(from):

19

Page(to):

36

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

Language:

English

Call no.:

P63600/3096

Type:

Conference Proceedings