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Fabrication of microrelief surfaces using a one-step lithography process (Invited Paper)

Author(s):
Reimer,K. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Hofmann,U. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Jurss,M. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Pulz,W. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Quenzer,H.J. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Wagner,B. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
1 more
Publication title:
Microelectronic Structures and MEMS for Optical Processing III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3226
Pub. date:
1997
Page(from):
2
Page(to):
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426581 [081942658X]
Language:
English
Call no.:
P63600/3226
Type:
Conference Proceedings

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