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Defect inspection and printability of deep-UV halftone phase-shifting mask

Author(s):
Kim,H.-J. ( Samsung Electronics Co.,Ltd. (Korea) )
Hong,J.-S. ( Samsung Electronics Co.,Ltd. (Korea) )
Kye,J.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
Cha,D.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
Kang,H.-Y. ( Samsung Electronics Co.,Ltd. (Korea) )
Moon,J.-T. ( Samsung Electronics Co.,Ltd. (Korea) )
1 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. Year:
1998
Page(from):
430
Page(to):
440
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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