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Three-dimensional electron-beam lithography simulator V2.O for the gigabit-era photomask manufacturing

Author(s):
Kim.Y.-H ( Samsung Electronics Co.,Ltd. (Korea) )
Cha.B.-C ( Samsung Electronics Co.,Ltd. (Korea) )
Lee,H.-J. ( Samsung Electronics Co.,Ltd. (Korea) )
Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) )
Kong,J.-T. ( Samsung Electronics Co.,Ltd. (Korea) )
Lee,S.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
1 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. date:
1998
Page(from):
358
Page(to):
365
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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