Current status of mask CD uniformity as related to e-beam system
- Author(s):
Lim,S.-C. ( Samsung Electronics Co.,Ltd. (Korea) ) Kim,B.-G. ( Samsung Electronics Co.,Ltd. (Korea) ) Choi,S.-W. ( Samsung Electronics Co.,Ltd. (Korea) ) Lee,K.-H. ( Samsung Electronics Co.,Ltd. (Korea) ) Cho,H.-J. ( Samsung Electronics Co.,Ltd. (Korea) ) Yu,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) ) Cho,H.-K. ( Samsung Electronics Co.,Ltd. (Korea) ) Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) ) - Publication title:
- 17th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3236
- Pub. Year:
- 1998
- Page(from):
- 301
- Page(to):
- 311
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426697 [0819426695]
- Language:
- English
- Call no.:
- P63600/3236
- Type:
- Conference Proceedings
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