Clear-field reticle defect disposition for advanced sub-half-micron lithography

Clear-field reticle defect disposition for advanced sub-half-micron lithography

Author(s):

Ibsen,K.B. ( Texas Instruments Inc. )
Ilzhoefer,J.R. ( Texas Instruments Inc. )
Eickhoff,M.D. ( KLA-Tencor Corp. )

Publication title:

17th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3236

Pub. Year:

1998

Page(from):

124

Page(to):

135

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426697 [0819426695]

Language:

English

Call no.:

P63600/3236

Type:

Conference Proceedings

Details

TDL ID:	ZA00016458
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1997 : 17th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1997.09.17-1997.09.19

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