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Plasma etching of Cr photomasks: optimization of process conditions and CD control

Author(s):
Constantine,C. ( Plasma-Therm,Inc. )
Johnson,D.J. ( Plasma-Therm,Inc. )
Westerman,R.J. ( Plasma-Therm, )
Coleman,T.P. ( Etec Systems,Inc. )
Faure,T. ( IBM Corp. )
Dubuque,L.F. ( IBM Corp. )
1 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. Year:
1998
Page(from):
94
Page(to):
103
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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