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Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation

Author(s):
  • Cha,B.-C. ( Samsung Electronics Co.,Ltd. (Korea) )
  • Kim,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
  • Choi,S.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
  • Yu,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
  • Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) )
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. date:
1998
Page(from):
34
Page(to):
41
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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