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RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Author(s):
  • Hirano,Y. ( NHK Science and Technical Research Labs. (Japan) )
  • Sato,F. ( NHK Science and Technical Research Labs. (Japan) )
  • Jayatissa,A.H. ( NHK Science and Technical Research Labs. (Japan) )
  • Ohtake,H. ( NHK Science and Technical Research Labs. (Japan) )
  • Takizawa,K. ( NHK Science and Technical Research Labs. (Japan) )
Publication title:
Photodetectors : materials and devices III : 28-30 January 1998, San Jose, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3287
Pub. Year:
1998
Page(from):
341
Page(to):
348
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427267 [0819427268]
Language:
English
Call no.:
P63600/3287
Type:
Conference Proceedings

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