Advanced gate technology for sub-0.25-ｦﾌm CMOSFETs (Invited Paper)

Advanced gate technology for sub-0.25-ｦﾌm CMOSFETs (Invited Paper)

Author(s):: King,T.-J. ( Univ.of California/Berkeley )
Publication title:: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3506
Pub. Year:: 1998
Page(from):: 41
Page(to):: 48
Pub. info.:: Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819429650 [0819429651]
Language:: English
Call no.:: P63600/3506
Type:: Conference Proceedings

Details

TDL ID:	ZA00016438
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Microelectronic device technology
Conf. info. (Number):	1998 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.09.23-1998.09.24

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