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Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper)

Author(s):
Hattangady,S.V. ( Texas Instruments Inc. )
Grider,O.T. ( Texas Instruments Inc. )
Kraft,R. ( Texas Instruments Inc. )
Shiau,W.-T. ( Texas Instruments Inc. )
Douglas,M.A. ( Texas Instruments Inc. )
Nicollian,P. ( Texas Instruments Inc. )
Rodder,M. ( Texas Instruments Inc. )
Brown,G.A. ( Texas Instruments Inc. )
Chatterjee,A. ( Texas Instruments Inc. )
Hu,J.C. ( Texas Instruments Inc. )
Aur,A. ( Texas Instruments Inc. )
Tsai,H.-L. ( Texas Instruments Inc. )
Chapman,R.A. ( Texas Instruments Inc. )
Eklund,R.H. ( Texas Instruments Inc. )
Chen,I.C. ( Texas Instruments Inc. )
Pas,M.F. ( Texas Instruments Inc. )
11 more
Publication title:
Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3506
Pub. date:
1998
Page(from):
30
Page(to):
40
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429650 [0819429651]
Language:
English
Call no.:
P63600/3506
Type:
Conference Proceedings

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