SELECTIVE CHEMICAL VAPOUR DEPOSITION OF TUNGSTEN USING SiH4WF6 CHEMISTRY
- 著者名:
- 掲載資料名:
- Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 168
- 発行年:
- 1990
- 開始ページ:
- 179
- 終了ページ:
- 184
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990562 [1558990569]
- 言語:
- 英語
- 請求記号:
- M23500/168
- 資料種別:
- 国際会議録
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