1.

国際会議録
国際会議録
1. THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS
Chang, J.P. ; Sapjeta, J. ; Rosamilia, J.M. ; Boone, T. ; Eng, J., Jr. ; Opila, R.L. ; Brennan, S. ; Wiemer, C. ; Pianetta, P.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.17-24,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
2.

国際会議録
国際会議録
2. Update on Synchrotron Radiation TXRF: New Results
Brennan, S. ; Pianetta, P. ; Ghosh, S. ; Takaura, N. ; Wiemer, C. ; Fischer-Colbrie, A. ; Laderman, S. ; Shimazaki, A. ; Waldhauer, A. ; Zaitz, M. A.
出版情報: Applications of synchrotron radiation techniques to materials science IV : sympoisum held April 13-17, 1998, San Francisco, California, U.S.A..  pp.245-,  1998.  Warrendale, Penn..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 524
3.

国際会議録
国際会議録
3. Precursor combinations for ALD of rare earth oxides and silicates-A quantum chemical and x-ray study
Elliott, S. D. ; Scarel, G. ; Wiemer, C. ; Fanciulli, M. ; Lebedinskii, Y. ; Zenkevich, A. ; Fedushkin, I. L.
出版情報: EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium.  pp.605-613,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-09
4.

国際会議録
国際会議録
4. Crystallization Behavior of Hf-Rich Aluminates and Influence on Film Dielectric Properties
Climent, M. ; Crivelli, B. ; Righini, G. ; Alberici, S. ; Alessandri, M. ; Elbaz, A.C. ; Pavia, G. ; Wiemer, C.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.313-318,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
5.

国際会議録
国際会議録
5. Physical-Chemical Evolution of Hf-Aluminates Upon Thermal Treatments
Crivelli, B. ; Alessandri, M. ; Alberici, S. ; Brazzelli, D. ; Elbaz, A. C. ; Frabboni, S. ; Ghidini, G. ; Maes, J. W. ; Ottaviani, G. ; Pavia, G. ; Wiemer, C.
出版情報: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.65-72,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 765