Pad Oxide Roughening in a Remote Plasma Etch Process for Silicon Nitride Using an In Situ Spectral Ellipsometer
- 著者名:
- 掲載資料名:
- Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1993-21
- 発行年:
- 1993
- 開始ページ:
- 373
- 終了ページ:
- 384
- 総ページ数:
- 12
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770668 [1566770661]
- 言語:
- 英語
- 請求記号:
- E23400/932473
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
kluwer Academic Publishers |
Materials Research Society |
kluwer Academic Publishers |
Electrochemical Society |
10
国際会議録
THE USE OF FRESNEL CONTRAST TO STUDY THE INITIAL STAGES OF THE IN SITU OXIDATION OF SILICON
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Electrochemical Society |