1.

国際会議録
国際会議録
1. Photomask lifetime issues in ArF lithography [5853-10]
Eschbach, F. ; Coon, P. ; Greenebaum, B. ; Mittal, A. ; Sanchez, P. ; Tanzil, D. ; Ng, G. ; Yun, H. ; Sengupta, A.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.74-82,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853
2.

国際会議録
国際会議録
2. Impact of DUV exposure on reticle repairs [5992-47]
Tolani, V. L. ; Chegwidden, S. ; Buenconsejo, E. C. ; Tanzil, D. ; Bald, D. J.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921A-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
3.

国際会議録
国際会議録
3. Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Korobko, Y.O. ; Fujita, M. ; Nakagawa, H.
出版情報: Optical Microlithography XVI.  Part Two  pp.1044-1054,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
4.

国際会議録
国際会議録
4. Pellicle-induced distortions in advance photomasks
Fujita, M. ; Akiyama, M. ; Kondo, M. ; Nakagawa, H. ; Tanzil, D. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.589-596,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Experimental and numerical studies of the effects of materials and attachment conditions on pellice-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Shu, E.Y.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.579-588,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
6.

国際会議録
国際会議録
6. Improving photomask surface properties through a combination of dry and wet cleaning steps
Eschbach, F.O. ; Tanzil, D. ; Kovalchick, M. ; Dietze, U.U. ; Liu, M. ; Xu, F.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.209-217,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
7.

国際会議録
国際会議録
7. ArF lithography reticle crystal growth contributing factors
Eschbach, F. ; Selassie, D. ; Sanchez, P. ; Tanzil, D. ; Tolani, V. ; Toofan, M. ; Liu, H. ; Greenebaum, B. ; Murray, M. ; Villacorta, R.
出版情報: 24th Annual BACUS Symposium on Photomask Technology.  pp.497-505,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5567