1.

国際会議録
国際会議録
1. 0.12-ｦﾌm logic process using a 248-nm step-and-scan system
Baker,D.C. ; Zheng,T. ; Takemoto,C.H. ; Sethi,S.S. ; Gabriel,C. ; Scott,G.S.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.294-304,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
2.

国際会議録
国際会議録
2. Application of a develop end point detector as a timely and cost-effective alternative to using an SEM for CD measurement in production photolithography
Velikov,D.L. ; Goldman,M. ; Hester,D. ; Kukas,A.W. ; Takemoto,C.H. ; Goetz,K. ; Zhang,H. ; Karklin,L.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.626-636,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725