1.

国際会議録
国際会議録
1. Soft Breakdown in Ultrathin Oxides
Weir, B. E. ; Silverman, P. J. ; Alers, G. B. ; Monroe, D. ; Alam, M. A. ; Sorsch, T. W. ; Green, M. L. ; Timp, G. L. ; Ma, Y. ; Frei, M. ; Liu, C. T. ; Bude, J. D. ; Krisch, K. S.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.301-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
2.

国際会議録
国際会議録
2. Relationship Between Interfacial Roughness and Dielectric Reliability for Silicon Oxynitride Gate Dielectrics Processed With Nitric Oxide
Sapjeta, J. ; Green, M. L. ; Chang, J. P. ; Silverman, P. J. ; Sorsch, T. W. ; Weir, B. E. ; Gladden, W. ; Ma, Y. ; Sung, C. Y. ; Lennard, W. N.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.289-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
3.

国際会議録
国際会議録
3. Flat-Band Voltage Study of Atomic-Layer-Deposited Aluminum-Oxide Subjected to Spike Thermal Annealing
Mehta, V. R. ; Fiory, A. T. ; Ravindra, N. M. ; Ho, M. Y. ; Wilk, G. D. ; Sorsch, T. W.
出版情報: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.109-114,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 765
4.

国際会議録
国際会議録
4. Minimization of Interfacial Microroughness for 13-60 ｢？Ultrathin Gate Oxides
Sapjeta, J. ; Boone, T. ; Rosamilia, J. M. ; Silverman, P. J. ; Sorsch, T. W. ; Timp, G. ; Weir, B. E.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.203-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477