1.

国際会議録
国際会議録
1. CD control for quarter-micron logic device gates using iso-pitch bias
Kim,Y.-C. ; Yeo,G.-S. ; Shin,H.-S. ; Kim,H. ; Kang,H.-Y. ; Chung,U-I.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.629-639,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
2.

国際会議録
国際会議録
2. Pt patterning as a storage node by chemically assisted physical etching for 1-Gb DRAM and beyond
Shin,H.-S. ; Kim,M.-P. ; Kim,J.-W. ; Kim,Y.-W. ; Choi,I.-H.
出版情報: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.169-177,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3882