1.

国際会議録
国際会議録
1. A novel integrated MEMS process using fluorocarbon films deposited with a deep reactive ion etching (DRIE) tool
Ayon, A. A. ; Chen, D-Z. ; Khanna, R. ; Braff, R. ; Sawin, H. H. ; Schmidt, M. A.
出版情報: Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.141-,  2000.  Warrendale, Pa..  MRS-Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 605
2.

国際会議録
国際会議録
2. Microreactors for Measuring Catalyst Activity and Determining Reaction Kinetics
Ajmera, S. K. ; Delattre, C. ; Schmidt, M. A. ; Jensen, K. F.
出版情報: Science and technology in catalysis 2002 : proceedings of the Fourth Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 14-19, 2002.  pp.97-102,  2003.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 145
3.

国際会議録
国際会議録
3. Effect of Composition on Resist Dry-Etching Susceptibility: Vinyl Polymers and Photoresists
Helbert, J. N. ; Schmidt, M. A.
出版情報: Polymer materials for electronic applications : based on a symposium sponsored by the Division of Organic Coatings and Plastics Chemistry at the second chemical congress of the North American continent (180th ACS national meeting), Las Vegas, Nevada, August 26-27, 1980.  pp.61-,  1982.  Washington, D.C..  American Chemical Society
シリーズ名: ACS symposium series
シリーズ巻号: 184