1.

国際会議録
国際会議録
1. Pre-Treatment Effect on Aluminum Thin Films Deposition From CVD Using Dimethylethylamine Alane
Jang, Tae Woong ; Rhee, Hwa Sung ; Ahn, Byung Tae
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.351-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
2.

国際会議録
国際会議録
2. Formation of TiSi2 Thin Films From Chemical Vapor Deposition Using Til4
Rhee, Hwa Sung ; Jang, Tae Woong ; Baek, Jong Tae ; Ahn, Byung Tae
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.345-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
3.

国際会議録
国際会議録
3. Silicon Field Emission Arrays Coated With CoSi2 Layer Grown by Reactive Chemical Vapor Deposition
Han, Byung Wook ; Rhee, Hwa Sung ; Ahn, Byung Tae ; Lee, Nam Yang
出版情報: Electron-emissive materials, vacuum microelectronics and flat-panel displsys : symposium held April 25-27 2000, San Francisco, California, U.S.A..  pp.R5.1-,  2001.  Pittsburgh, PA..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 621
4.

国際会議録
国際会議録
4. In Situ Growth and Growth Kinetics of Epitaxial (100) CoSi2 Layer on (100) Si by Reactive Chemical Vapor Deposition
Rhee, Hwa Sung ; Lee, Heui Seung ; Park, Jong Ho ; Ahn, Byung Tae
出版情報: Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A..  pp.C10.3-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 611