1.

国際会議録
国際会議録
1. Influence of antireflection coatings in ArF lithography
La Fontaine, B.M. ; Pawloski, A.R. ; Acheta, A. ; Deng, Y. ; Levinson, H.J. ; Spence, C. ; Chovino, C. ; Dieu, L. ; Johnstone, E. ; Kalk, F.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.995-1005,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
2.

国際会議録
国際会議録
2. Understanding the role of base quenchers in photoresists
Michaelson, T.B. ; jamieson, A.T. ; Pawloski, A.R. ; Byers, J.D. ; Acheta, A. ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XXI.  pp.1282-1294,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
3.

国際会議録
国際会議録
3. EUV mask making: an approach based on the direct patterning of the EUV reflector
Chovino, C. ; Dieu, L. ; Johnstone, E. ; Reyes, J. ; La Fontaine, B.M. ; Levinson, H.J. ; Pawloski, A.R.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.566-572,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
4.

国際会議録
国際会議録
4. Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
La Fontaine, B. ; Pawloski, A.R. ; Deng, Y. ; Chovino, C. ; Dieu, L. ; Wood, O.R., II ; Levinson, H.J.
出版情報: Emerging Lithographic Technologies VIII.  pp.300-310,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5374
5.

国際会議録
国際会議録
5. Simulation of fine structures and defects in EUV etched multilayer masks
Deng, Y. ; La Fontaine, B. ; Pawloski, A.R. ; Neureuther, A.R.
出版情報: Emerging Lithographic Technologies VIII.  pp.760-769,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5374
6.

国際会議録
国際会議録
6. Characterization of line-edge roughness in photoresist using an image fading technique
Pawloski, A.R. ; Acheta, A. ; Lalovic, I. ; Fontaine, B.M.L. ; Levinson, H.J.
出版情報: Advances in Resist Technology and Processing XXI.  pp.414-425,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376