1.

国際会議録
国際会議録
1. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. Alternating phase-shifted mask for logic gate levels,design,and mask manufacturing
Liebmann,L.W. ; Graur,I.C. ; Leipold,W.C. ; Oberschmidt,J.M. ; O'Grady,D.S. ; Regaill,D.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.27-37,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
3.

国際会議録
国際会議録
3. X-ray exposure in the manufacture of sub-150-nm gate lines
Lamberti,A.C. ; Agnello,P.D. ; Crabbe,E.F. ; Guardia,R.Della ; Oberschmidt,J.M. ; Subbana,S. ; Wu,S.
出版情報: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.237-248,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2723