1.

国際会議録
国際会議録
1. Hot spot management in ultra-low kl lithography [6156-24]
Hashimoto, K. ; Usui, S. ; Nojima, S. ; Tanaka, S. ; Yamanaka, E. ; Inoue, S.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. NMR Studies of the Dynamics of Homo- and Block-Copolymer Poly(ε-caprolactone) Chains in Their Inclusion Compounds with α-and γ-CDs
Lu, J. ; Mirau, P.A. ; Nojima, S. ; Tonelli, A.E.
出版情報: NMR spectroscopy of polymers in solution and in the solid state.  pp.43-57,  2003.  Washington, D.C..  American Chemical Society
シリーズ名: ACS symposium series
シリーズ巻号: 834
3.

国際会議録
国際会議録
3. Lithography simulation system for total CD control from design to manufacturing
Kotani, T. ; Ichikawa, H. ; Kobayashi, S. ; Nojima, S. ; Izuha, K. ; Tanaka, S. ; Inoue, S.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.219-229,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
4.

国際会議録
国際会議録
4. *SMALL-ANGLE X-RAY SCATTERING STUDY OF MICRO- AND MICRO-PHASE SEPARATIONS IN BLENDS OF BLOCK COPOLYMER WITH HOMOPOLYMER
Roe, R. J. ; Nojima, S.
出版情報: Scattering, deformation, and fracture in polymers : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A..  pp.151-158,  1987.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 79
5.

国際会議録
国際会議録
5. Selective Reduction of NOx over Ir/Metallosilicate Catalyst for a Lean Burn Gasoline Engine
Nojima, S. ; Iida, K. ; Kobayashi, N.
出版情報: Science and technology in catalysis 2002 : proceedings of the Fourth Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 14-19, 2002.  pp.499-500,  2003.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 145
6.

国際会議録
国際会議録
6. Yield-enhanced layout generation by new design for manufacturability (DfM) flow
Kotani, T. ; Tanaka, S. ; Nojima, S. ; Hashimoto, K. ; Inoue, S. ; Mori, I.
出版情報: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.128-138,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5379
7.

テクニカルペーパー
テクニカルペーパー
7. Technologies for Practical Application of a TBW System for Large Motorcycle with Improved Driving Feel, Sound Quality, and Layout Flexibility.
Nishimura, S. ; Tetsuka, T. ; Asada, Y. ; Kono, T. ; Tsuyuguchi, M. ; Nojima, S.
出版情報: 2010 SAE world congress : technical paper.  2010.  Warrendale, Penn..  Society of Automotive Engineers
シリーズ名: Society of Automotive Engineers technical paper series
シリーズ巻号: 2010
8.

国際会議録
国際会議録
8. Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)
Kotani, T. ; Ichikawa, H. ; Urakami, T. ; Nojima, S. ; Kobayashi, S. ; Oikawa, Y. ; Tanaka, S. ; Ikeuchi, A. ; Suzuki, K. ; Inoue, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.628-637,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
9.

国際会議録
国際会議録
9. Model-based PPC verification methodology with two dimensional pattern feature extraction
Hashimoto, K. ; Ito, T. ; Ikeda, T. ; Nojima, S. ; Inoue, S.
出版情報: Optical Microlithography XVI.  Part Two  pp.1156-1165,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
10.

国際会議録
国際会議録
10. Enhanced flexible mask specifications
Hasebe, S. ; Nojima, S. ; Mimotogi, S. ; Tanaka, S. ; Ikenaga, O. ; Hashimoto, K. ; Inoue, S. ; Mori, I.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.593-599,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130