Maex, K. ; Lauwers, A. ; Van Hove, M. ; Vandervorst, W. ; Van Rossum, M.
出版情報:
Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.869-874, 1993. Pittsburgh, Pa.. Materials Research Society
Maex Karen ; Vandenabeele, P. ; Deweerdt, B. ; Coppye, W. ; Vermeiren, C. ; Lauwers, A. ; Maex, K.
出版情報:
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.. pp.133-144, 1992. Pittsburgh, Pa.. Materials Research Society
Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A.. pp.173-178, 1990. Pittsburgh, Pa.. Materials Research Society
Baklanov, M. ; Kondoh, E. ; Vanhaelemeersch, S. ; Maex, K.
出版情報:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.602-609, 1997. Pennington, NJ. Electrochemical Society
Iacopi, F. ; Brongersma, S.H. ; Abell, T.J. ; Maex, K.
出版情報:
Polymer/metal interfaces and defect mediated phenomena in ordered polymers : symposia held December 2-6, 2002, Boston, Massachusetts, U.S.A.. pp.383-780, 2003. Warrendale, Pa.. Materials Research Society
Lindsay, R. ; Pawlak, B. ; Henson, K. ; Satta, A. ; Severi, S. ; Lauwers, A. ; Surdeanu, R. ; McCoy, S. ; Gelpey, J. ; Pages, X. ; Maex, K.
出版情報:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.145-156, 2004. Pennington, NJ. Electrochemical Society
Kim, Y.B. ; Conard, T. ; Vanhaeren, D. ; Baklanov, M. ; Vanhaelemeersch, S. ; Vandervorst, W. ; Maex, K.
出版情報:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.610-616, 1997. Pennington, NJ. Electrochemical Society
Akheyar, A. ; Lauwers, A. ; Kitti, J.A. ; De Potter, M ; Chamirian, O. ; Jonckheere, R. ; Leunissen, P. ; van Dal, M ; Lindsay, R. ; Tempel, G. ; Maex, K.
出版情報:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.197-204, 2003. Pennington, NJ. Electrochemical Society
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.206-215, 2003. Pennington, N.J.. Electrochemical Society
Proceedings of the Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution Including Modeling. pp.521-526, 1997. Pennington, New Jersey. Electrochemical Society
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