1.

国際会議録
国際会議録
1. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. Does digital deconvolution improve two-photon microscopy in deep tissue imaging?
Noakes,C.R. ; Goto,T. ; Keller,R. ; Periasamy,A.
出版情報: Multiphoton microscopy in the biomedical sciences, 21-23 January, 2001, San Jose, USA.  pp.389-395,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4262
3.

国際会議録
国際会議録
3. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
4.

国際会議録
国際会議録
4. Perturbed Angular Correlation Spectroscopy of In-Li Pairs in Silicon
Deicher,M. ; Grubel,G. ; Keller,R. ; Recknagel,E. ; Schulz,N. ; Skudlik,H. ; Wichert,Th.
出版情報: Proceedings of the 15th International Conference on Defects in Semiconductors : Budapest, Hungary, August 22-26, 1988.  Part1  pp.367-372,  1989.  Aederlmannsdorf, Switzwelns.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 38-41
5.

国際会議録
国際会議録
5. Thermal Stability of Acceptor-Hydrogen Pairs in Silicon
Deicher,M. ; Grtibel,G. ; Keller,R. ; Recknagel,E. ; Schulz,N. ; Skudlik,H. ; Wichert,Th.
出版情報: Proceedings of the 15th International Conference on Defects in Semiconductors : Budapest, Hungary, August 22-26, 1988.  Part3  pp.1045-1050,  1989.  Aederlmannsdorf, Switzwelns.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 38-41
6.

国際会議録
国際会議録
6. ArF resist for contact hole application
Chen,K.-J.R. ; Lawaon,M.C. ; Hughes,T. ; Brunsvld,W.R. ; Varanasi,P.R. ; Keller,R. ; Jordhamo,G.M.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.791-797,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345