1.

国際会議録
国際会議録
1. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
2.

国際会議録
国際会議録
2. Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers
Kavanagh, R.J. ; Orsula, G.W. ; Hellion, M. ; Barclay, G.G. ; Caporale, S. ; Pugliano, N. ; Thackeray, J.W. ; Mortini, B.P.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.141-149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists
Bae, Y.C. ; Ogawa, T. ; Kavanagh, R.J. ; Kobayashi, T. ; Lindsay, T. ; Tanaka, T. ; Xu, C.B. ; Orsula, G. ; DeSisto, J. ; Hellion, M.
出版情報: Advances in Resist Technology and Processing XXI.  pp.1123-1130,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
4.

国際会議録
国際会議録
4. Mechanistic understanding of post-etch roughness in 193-nm photoresists
Bae, Y.C. ; Barclay, G.G. ; Bolton, P.J. ; Kavanagh, R.J. ; Bu, L. ; Kobayashi, T. ; Adams, T. ; Pugliano, N. ; Thackeray, J.W.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.665-671,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
5.

国際会議録
国際会議録
5. Methods to achieve sub-100-nm contact hole lithography
Lindsay, T.K. ; Kavanagh, R.J. ; Pohlers, G. ; Kanno, T. ; Bae, Y.C. ; Barclay, G.G. ; Kanagasabapathy, S. ; Mattia, J.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.705-712,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039