1.

国際会議録
国際会議録
1. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists
Varanasi,P.R. ; Cornett,K.M. ; Katnani,A.D.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.512-523,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
3.

国際会議録
国際会議録
3. Probing the environmental stability and bake latitudes of acetal vs.ketal protected polyvinylphenol DUV resist systems
Kumar,U. ; Pandya,A. ; Sinta,R.F. ; Huang,W.-S. ; Bantu,R. ; Katnani,A.D.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.135-145,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
4.

国際会議録
国際会議録
4. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
5.

国際会議録
国際会議録
5. Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
Huang,W.-S. ; Sooriyakumaran,R. ; Kwong,R.W. ; Katnani,A.D.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.776-785,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
6.

国際会議録
国際会議録
6. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
7.

国際会議録
国際会議録
7. Effects of crosslinking agent on lithographic performance of negative-tone resists based on poly(p-hydroxystyrene)
Lin,Q. ; Katnani,A.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.974-987,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
8.

国際会議録
国際会議録
8. Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist:KRS
Petrillo,K. ; Brancaccio,J. ; Huang,W.-S. ; Kwong,R.W. ; Katnani,A.D.
出版情報: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.319-328,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3048