1.

国際会議録
国際会議録
1. Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer
Kasprowicz,B.S. ; Eynon,B.G. ; Morrison,T.B. ; Wang,C.-Y.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.338-349,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Evaluation of new mask materials for improved lithography performance
Kasprowicz,B.S. ; Priestley,R.
出版情報: Optical Microlithography XIV.  4346  pp.827-830,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
3.

国際会議録
国際会議録
3. Investigating inspectability and printability of contamination deposited during SEM analysis
Kasprowicz,B.S. ; Ananth,M. ; Wang,C.-Y.
出版情報: 20th Annual BACUS Symposium on Photomask Technology.  pp.654-662,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4186
4.

国際会議録
国際会議録
4. Application of critical shape analyses to two-dimensional patterns
Pochkowski,M. ; Mack,C.A. ; Kasprowicz,B.S.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.169-176,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
5.

国際会議録
国際会議録
5. Comparison of 2D measurement methodologies and their viability in a manufacturing environment
Kasprowicz,B.S. ; Taylor,D. ; Hathorn,M.E.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.840-851,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562