1.

国際会議録
国際会議録
1. Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]
Kim, I.-S. ; Suh, S. ; Jung, S. ; Lee, E. ; Kang, Y.-S. ; Lee, S. ; Woo, S.-G. ; Cho, H.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32]
Jung, S. ; Kim, I.-S. ; Kang, Y.-S. ; Yeo, G.-S. ; Woo, S.-G. ; Cho. H. ; Moon, K.-T.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
3.

国際会議録
国際会議録
3. Ferroelectric PZT/AIGaN/GaN field effecttransistors (Invited Paper) [6121-28]
Kang, Y.-S. ; Xiao, B. ; Alivov, Ya. I. ; Fan, Q. ; Xie, J. ; Morkoc H ; Eddy Jr C R
出版情報: Gallium Nitride Materials and Devices.  pp.61210S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6121
4.

国際会議録
国際会議録
4. Optical path and image performance monitoring of a full-field 157-nm scanner
Wells, G. ; Hermans, J. ; Watso, R. ; Kang, Y.-S. ; Morton, R. ; Kocsis, M.K. ; Okoroanyanwu, U. ; De Bisschop, P. ; Stepanenko, N. ; Ronse, K.G.
出版情報: Optical Microlithography XVII.  pp.91-98,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377