1.

国際会議録
国際会議録
1. Pre-Treatment Effect on Aluminum Thin Films Deposition From CVD Using Dimethylethylamine Alane
Jang, Tae Woong ; Rhee, Hwa Sung ; Ahn, Byung Tae
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.351-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
2.

国際会議録
国際会議録
2. Formation of TiSi2 Thin Films From Chemical Vapor Deposition Using Til4
Rhee, Hwa Sung ; Jang, Tae Woong ; Baek, Jong Tae ; Ahn, Byung Tae
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.345-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514