1.

国際会議録
国際会議録
1. Buckling Instabilities of Thin Cap Layers Deposited Onto Low-k Dielectric Films
Iacopi, F. ; Brongersma, S.H. ; Abell, T.J. ; Maex, K.
出版情報: Polymer/metal interfaces and defect mediated phenomena in ordered polymers : symposia held December 2-6, 2002, Boston, Massachusetts, U.S.A..  pp.383-780,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 734
2.

国際会議録
国際会議録
2. Processing Damage and Electrical Performance of Porous Dielectrics in Narrow Spaced Interconnects
Iacopi, F. ; Travaly, Y. ; Stucchi, M. ; Struyf, H. ; Peeters, S. ; Jonckheere, R. ; Leunissen, L.H.A. ; Tokei, Zs. ; Sutcliffe, V. ; Richard, O. ; Hove, M.Van ; Maex, K.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.19-24,  2004.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 812
3.

国際会議録
国際会議録
3. On Factors Affecting the Extraction of Elastic Modulus by Nanoindentation of Organic Polymer Films
Iacopi, F. ; Laknin, M. ; Mulloy, A. ; den-Toonder, J. M. J. ; Vanhaeren, D. ; Brongersma, S. H.
出版情報: Fundamentals of nanoindentation and nanotribology III : symposium held November 29-December 3, 2004, Boston, Massachusetts, U.S.A..  pp.181-186,  2005.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 841
4.

国際会議録
国際会議録
4. Understanding Adhesion Failure in Low-k Dielectric Stack During Chemical-Mechanical Polishing
Iacopi, F. ; Degryse, D. ; Vos, I. ; Patz, M. ; Maex, K.
出版情報: Thin films : stresses and mechanical properties X : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A..  pp.131-136,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 795
5.

国際会議録
国際会議録
5. Zeolite Low-k Film Properties Dependence on Nanocrystal Size
Eslava-Fernandez, Salvador ; Baklanov, M. R. ; Iacopi, F. ; Brongersma, S.H. ; Kirschhock, C.E.A. ; Maex, K.
出版情報: Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A..  pp.421-426,  2006.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 914