Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
出版情報:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.284-291, 1995. Pennington, NJ. Electrochemical Society
Hurd, T.Q. ; Rotondaro, A.L.P. ; Sees, J. ; Misra, A. ; Appel, C.
出版情報:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.105-112, 1997. Pennington, NJ. Electrochemical Society
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.277-283, 1995. Pennington, NJ. Electrochemical Society
Mertens, P.W. ; Hurd, T.Q. ; Graf, D. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M.
出版情報:
Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. pp.241-252, 1994. Pennington, NJ. Electrochemical Society
Elsmore, C. ; Hurd, T.Q. ; Clarke, J. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.142-149, 1995. Pennington, NJ. Electrochemical Society