1.

国際会議録
国際会議録
1. Optimization of the e-beam sensitive bilayer CARL process for stencil mask making
Ochsenhirt,J. ; Butschke,J. ; Letzkus,F. ; Hofflinger,B. ; lrmscher,M. ; Reuter,C. ; Springer,R. ; Elian,K.
出版情報: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.80-89,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3996
2.

国際会議録
国際会議録
2. High-performance TSI process for e-beam using vapor-applied crosslinking silylating agents
Irmscher,M. ; Hofflinger,B. ; Springer,R. ; Stauffer,C. ; Peterson,W.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.564-577,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
3.

テクニカルペーパー
テクニカルペーパー
3. Improved Driver Information and Driver Assistance by Prometheus Systems
Hamm,L. ; Charentenay,F.de ; Hofflinger,B. ; Reister,D. ; Sandewall,E. ; Williams,M.
出版情報: XXIII FISITA Congress, Trino(Italy), 7-11 May 1990 : the promise of new technology in the automotive industry.  pp.485-496,  1990.  Society of Automotive Engineering, Inc.
シリーズ名: SAE publication
シリーズ巻号: P-235