1.

国際会議録
国際会議録
1. 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Brock,P.J. ; Larson,C.E. ; DiPietro,R.A. ; Wallraff,G.M. ; Hofer,D.C. ; Dawson,D.J. ; Mahorowala,A.P. ; Angelopoulos,M.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1171-1180,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
2.

国際会議録
国際会議録
2. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
3.

国際会議録
国際会議録
3. Design of an etch-resistant cyclic olefin photoresist
Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; DiPietro,R.A. ; Hofer,D.C. ; Jayaraman,S. ; Hullihan,K.A. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.463-471,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
4.

国際会議録
国際会議録
4. Role of photoacid structure on the performance of 193-nm resists
Allen,R.D. ; Opitz,J. ; Larson,C.E. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.44-54,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
5.

国際会議録
国際会議録
5. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
6.

国際会議録
国際会議録
6. Dissolution/swelling behavior of cycloolefin polymers in aqueous base
Ito,H. ; Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; Truong,H.D. ; Hofer,D.C. ; Varanasi,P.R. ; Jordhamo,G.M. ; Jayaraman,S. ; Vicari,R.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.2-12,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
7.

国際会議録
国際会議録
7. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
8.

国際会議録
国際会議録
8. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
9.

国際会議録
国際会議録
9. Protecting groups for 193-nm photoresists
Allen,R.D. ; Sooriyakumaran,R. ; Opitz,J. ; Wallraff,G.M. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C. ; Kunz,R.R. ; Jayaraman,S. ; Shick,R. ; Goodall,B. ; Okoroanyanwu,U. ; Wilson,C.G.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.334-343,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
10.

国際会議録
国際会議録
10. Limits to etch resistance for 193-nm single-layer resists
Kunz,R.R. ; Palmateer,S.C. ; Forte,A.R. ; Allen,R.D. ; Wallraff,G.M. ; DiPietro,R.A. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.365-376,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724