1.

国際会議録
国際会議録
1. Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist
K. Choi ; V. M. Prabhu ; K. A. Lavery ; E. K. Lin ; W. Wu ; J. T. Woodward ; M. J. Leeson ; H. B. Cao ; M. Chandhok ; G. Thompson
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
2.

国際会議録
国際会議録
2. Phenolic molecular glasses as resists for next-generation lithography
X. Andre ; J. K. Lee ; A. D. Silva ; N. Felix ; C. K. Ober ; H. B. Cao ; H. Deng ; H. Kudo ; D. Watanabe ; T. Nishikubo
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
3.

国際会議録
国際会議録
3. Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography
A. Saeki ; T. Kozawa ; S. Tagawa ; H. B. Cao ; H. Deng
出版情報: Advances in resist materials and processing technology XXV.  1  pp.69230S-1-69230S-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923