1.

国際会議録
国際会議録
1. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
2.

国際会議録
国際会議録
2. 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.282-292,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
3.

国際会議録
国際会議録
3. An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate With Ozone as Oxidizer
Gutt, J. ; Brown, G.A. ; Senzaki, Yoshi ; Park, Seung
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.25-30,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
4.

国際会議録
国際会議録
4. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
5.

国際会議録
国際会議録
5. Towards 0.5 nm EOT Scaling of HfO2/Metal Electrode Gate Stacks
Peterson, J. J. ; Brown, G. A. ; Matthews, K. ; Gutt, J. ; Gopalan, S. ; Li, H. -J. ; Kirsch, P. ; Barnett, J. ; Moumen, N. ; Huffman, C. ; Majhi, P. ; Chaudhary, N. ; Young, C. D. ; Sassman, B. ; Lee, B. -H. ; Ruelke, H. ; Schuehrer, H. ; Stephan, R. ; Wei, A. ; Werner, T. ; Wieczorek, K. ; Raab, M.
出版情報: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.443-451,  2004.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-04